PLD Systems
PLD Workstation
Laser MBE cluster tool systems
Large Area PLD systems
Plume-Master control software
PLD components:
Heater manipulators
Target manipulators
Laser heater
High pressure RHEED systems
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Laser Heater
900°C..
1000°C..
1200°C and beyond
The ideal UHV heater
The generation of high temperatures in UHV
applications is always a compromize between the demand of
the process and the available heat source for such
temperature.The individual vapaour pressure of all
involved materials of the heater generate under UHV conditions
a mixture of partial pressures - what could generate
probplems with the process conditions. This problem increase with
higher temperatures extreme together with the demand in
oxygen resistance of the heater material
The size of the substrate is an other restriction. SURFACE is
specialized in the development and production of advanced heater
technoloogy for UHV thin film technologies.
High Power
Diode Laser - the source for clean
heating
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SURFACE has developed
a Laser heater system for substrate sizes of up to 10 mm in
diameter, using the latest available diode laser
technology, SURFACE offers a 90 W Laser modul - compact and
ready to use with all necessary power
supplies.
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The complete Laser
module LH 90 is a compact unit in a
380x300x155 mm steel case.
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The necessary cooling power
for the diodes will be supplied from a special cooling module
what takes care of the special demands in cooling performance of
the Laser. The laser is available for 808 or 940 nm wave length.
A light fiber directs the light through a customised focussing
optic to the substrate in the distance the customer needs. The
window is a standard CF 40 glas
viewport.
The total solution from SURFACE
Laser module LH 90
and the individual substrate
manipulator.
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To achive high
temperatures , the handling of the substrate has to
recognize the limited power of 90 W. With an adapted
design, 1000°C for a 10 mm sample are possible. A
temperasture of 1200°C and higher will be
achived on a substrate 5x5 mm.
An OMICRON AFM substrate holder (15x18 mm) will be heates
to approx. 950°C
The temperature measurement has to be done with a
pyrometer, the substrate manipulator includes a thermo-
couple, mounted in the front shutter to control the
settings of the pyrometer emission
coefficient.
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The SURFACE Goniometer Head
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SURFACE
offers several solutions for substrate manipulators, always recognizing the demands in
the substrate transfer of UHV systems.
One solution is including a
goniometer stage for a high precise substrate manipulation
to optimize the cristall orientation of the substrate to
the ebeam of the insitu High pressure RHEED
measurement. The manipulator has 3 freedoms, all
of them are back lash free.
Tollerances:
| Axis |
range |
resolution |
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Z-motion: |
1" |
0,02 mm |
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Rotation: |
+/- 60° |
0,02° |
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Tilt: |
+/- 3° |
0,02° |
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