PLD Systems
PLD Workstation
Laser MBE cluster tool systems
Large Area PLD systems
Plume-Master control software
PLD components:
Heater manipulators
Target manipulators
Laser heater
High pressure RHEED systems
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Heating in O2 atmosphere
Heaters in high
oxygen containing gas atmospheres are always a problem.
Additional demands like UHV compatibility increases the
problem, standard heater meterials, used under HV
conditions, are not suitable. The vapor pressure is too
high for UHV conditions.
The
heater:
All SURFACE heaters are
radiation heaters and based on a black body concept. The
combination with special designed substrate holders this
generates an exellent homogenity of the substrate
temperature. The heater body is built of pure AL2 O3
ceramic, all other materials used are temperature rated.
The heat loss is minimized by using multiple radiation
shields.
Flexible
temperature measurment solutions:
This important point can only
be optimized based on the actual application. Exact in situ
temperature measurement of substrates in deposition
processes is very difficult. If the substrate is infrared
transparent in the beginning and looses this feature with
the deposition the difficulty is increased.
SURFACE provides a range of solutions to optimize this
point.
·
direct measurement for non - rotating small
samples.
The thermocouple penetrates the
substrate holder, the substrate is attached to a substrate
carrier with thermally conductive paste. This carrier can
be transfered with a manipulator. That is the best solution
for IR transparent substrates, because of the good thermal
contact to the carrier and the thin substrate.
·indirect measurement for rotating
substrates
The thermocouple is placed near
the backside of the substrate. The substrate is directly in
radiation contact with the heater. The substrate rotates
permanently.
·
front shielded heater
This is the best solution, if
the process does not demand a permanent open substrate face
to the deposition source. In combination with permanent
substrate rotation the front shielding can cover up to 90%.
In addition to the heater SURFACE provides complete
manipulator solutions. The above picture shows a heater
installed in a substrate manipulator of a PLD system for
HTSC deposition.
The thermocouple penetrates the substrate holder, the
substrate is attached to a substrate carrier with termally
conductive paste.
The substrate rotates +/- 180° and tilts +/- 3°
for RHEED optimation.
This carrier can be transfered by a manipulator.
A range of solutions for substrate transfers is
available.
The
powersupply
In addition to the heater
SURFACE provides the complete heater powersupply. It
includes an advanced digital PID loop controller and a low
power supply. more
information
Available
standard heaters:
|
| Substrate (") |
heater O.D. (mm) |
height (mm) |
powersupply (W) |
|
1 |
75 |
65 |
600 |
|
3 |
125 |
65 |
1200 |
|
6 |
200 |
70 |
3500 |
|
8 |
250 |
70 |
6000 |
Specifications:
|
| max. substrate
temperature: |
850° C *) |
| heater materials: |
special heater alloy |
| |
AL2 O3, SS, Cu |
| max. O2 pressure: |
10 torr |
| temperature
homogeneity: |
<1 3% (depending on size) |
| substrate holder: |
depending on application |
| |
*) 1000° with Pt heater
material. |
©by SURFACE 1998 |
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